Models dedicated to lithography:
Models combining lithography, deposition techniques and characterization :
Overview:
The Vistec is a model unique in Canada having a 1.2 mm field, a writing speed up to 50 MHz and an acceleration of 100 keV. A 25 nm resolution is routinely obtained; down to 10 nm depending on the process.
The two instruments from Zeiss (1530 Supra 55 VP and 1540XB CrossBeam) are multifonctional and can be used for : high resolution lithography, SEM, cathodoluminescence characterization, EBIC, EDS (1530 Supra 55 VP); high resolution lithography, ion beam etching, deposition, SEM and STEM (1540XB CrossBeam).
Routine processes - overview
Negative resist
| Positive resist
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Minimum feature size : 50 nm
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Minimum feature size : 10 nm
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Thickness : 50 nm to 600 nm
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Thickness : 50 nm to 1500 nm |
Use this equipment
Overview:
A variety of manual spin coaters are available for resist deposition. The Spinball model offers a completely automated operation via saved recipes and automated edgebead removal.
The EVG101 model is equipped with an atomiser head capable of dispensing resist in a conformal manner on non-planar surfaces.
Use this equipment
